Measurement of the Adhesion Force between Carbon Nanotubes and a Silicon Dioxide Substrate

Authors

Jed D. Whittaker
Ethan D. Minot
David M. Tanenbaum
Paul L. McEuen
Robert C. Davis

Document Type

Article

Department

Physics (Pomona)

Publication Date

4-2006

Keywords

nanotube, adhesion force, atomic force, slippage, silicon dioxide layer

Abstract

Carbon nanotube adhesion force measurements were performed on single-walled nanotubes grown over lithographically defined trenches. An applied vertical force from an atomic force microscope (AFM), in force distance mode, caused the tubes to slip across the 250-nm-wide silicon dioxide trench tops at an axial tension of 8 nN. The nanotubes slipped at an axial tension of 10 nN after being selectively coated with a silicon dioxide layer.

Rights Information

Copyright © 2011 American Chemical Society

Recommended Citation

Whittaker, Jed D., Ethan D. Minot, David M. Tanenbaum, Paul L. McEuen, and, Robert C. Davis. "Measurement of the Adhesion Force between Carbon Nanotubes and a Silicon Dioxide Substrate," in Nano Letters 2006 6 (5), 953-957. DOI: 10.1021/nl060018t