Date of Award

4-1-2006

Document Type

Open Access Senior Thesis

Degree Name

Bachelor of Science

Department

Physics & Astronomy

First Thesis Advisor

David Tanenbaum

Rights Information

© 2006 James McFarland

Terms of Use & License Information

Terms of Use for work posted in Scholarship@Claremont.

Abstract

This work uses a modification of the chemical vapor deposition (CVD) technique to study the effects of source gas flow geometry (and the corresponding parameters) on carbon nanotube growth. Our approach is to flow the carbon-containing source gas through a nozzle, projecting the gas stream onto targeted regions of the substrate. This technique not only allows the potential for localized nanotube growth, but also offers an interesting opportunity to provide an experimental test of theoretical nanotube growth models.

Comments

Previously linked to as: http://ccdl.libraries.claremont.edu/u?/stc,4

OCLC number: 549439163


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