Maskless Projection Lithography

Author

J. David Musgraves, Pomona CollegeFollow

Graduation Year

2003

Document Type

Open Access Senior Thesis

Degree Name

Bachelor of Science

Department

Physics & Astronomy

Reader 1

David Tanenbaum

Terms of Use & License Information

Terms of Use for work posted in Scholarship@Claremont.

Rights Information

© 2003 J. David Musgraves

Abstract

Photolithography is a key element of the modem integrated circuit process. It is photolithography, combined with metal deposition, that allows a three dimensional circuit to be built up on a two dimensional surface. Since it is such an important part of the semiconductor manufacturing industry, a massive base of research in this area already exists. The problem with this pre-existing research is that it is geared solely toward industrial purposes, as opposed to more academic research areas. The goal of my research is to move this industrial process into the academic setting of Pomom College.

Comments

Previously linked to as: http://ccdl.libraries.claremont.edu/u?/stc,6

OCLC number: 549519092

Recommended Citation

Musgraves, J. David, "Maskless Projection Lithography" (2003). Pomona Senior Theses. 17.
https://scholarship.claremont.edu/pomona_theses/17