Measurement of the Adhesion Force between Carbon Nanotubes and a Silicon Dioxide Substrate
Document Type
Article
Department
Physics (Pomona)
Publication Date
4-2006
Keywords
nanotube, adhesion force, atomic force, slippage, silicon dioxide layer
Abstract
Carbon nanotube adhesion force measurements were performed on single-walled nanotubes grown over lithographically defined trenches. An applied vertical force from an atomic force microscope (AFM), in force distance mode, caused the tubes to slip across the 250-nm-wide silicon dioxide trench tops at an axial tension of 8 nN. The nanotubes slipped at an axial tension of 10 nN after being selectively coated with a silicon dioxide layer.
Rights Information
Copyright © 2011 American Chemical Society
Recommended Citation
Whittaker, Jed D., Ethan D. Minot, David M. Tanenbaum, Paul L. McEuen, and, Robert C. Davis. "Measurement of the Adhesion Force between Carbon Nanotubes and a Silicon Dioxide Substrate," in Nano Letters 2006 6 (5), 953-957. DOI: 10.1021/nl060018t
